• DocumentCode
    3051748
  • Title

    Fabrication of volcano-structured double-gate FEAs by etch-back technique

  • Author

    Soda, T. ; Nagao, M. ; Yasumuro, C. ; Kanemaru, S. ; Sakai, T. ; Saito, N. ; Neo, Y. ; Aoki, T. ; Mimura, H.

  • Author_Institution
    Shizuoka Univ., Hamamatsu
  • fYear
    2007
  • fDate
    5-8 Nov. 2007
  • Firstpage
    526
  • Lastpage
    527
  • Abstract
    Volcano-structured double-gate field emission display (VDG-FEA) is fabricated by etch-back technique. Electron trajectories from VDG-FEA are roughly calculated using charged particle trajectories simulation program SIMION.
  • Keywords
    etching; field emission displays; SIMION program; VDG-FEA; charged particle trajectories simulation; electron trajectories; etch-back technique; volcano-structured double-gate field emission display; Current density; Degradation; Electrodes; Electron beams; Etching; Fabrication; Flat panel displays; Focusing; Hafnium; Niobium;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology, 2007 Digest of papers
  • Conference_Location
    Kyoto
  • Print_ISBN
    978-4-9902472-4-9
  • Type

    conf

  • DOI
    10.1109/IMNC.2007.4456336
  • Filename
    4456336
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3051748