Low loss silicon window material for submillimeter waves using micromachined artificial dielectrics for anti-reflection coating

Author

Biber, S. ; Schneiderbanger, D. ; Schmidt, L.P. ; Walther, M. ; Fischer, B. ; Schwarzer, M. ; Jepsen, P.U.

Author_Institution

Inst. for Microwave Technol., Erlangen-Nurnberg Univ., Erlangen, Germany

fYear

2004

fDate

27 Sept.-1 Oct. 2004

Firstpage

105

Lastpage

106

Abstract

A high-resistivity silicon wafer was used to design a broad-band low loss window material for 600 GHz by micromachining an artificial dielectric as a quarter wave transformer on the front and rear side of the wafer. The artificial dielectric is made from a 2-dimensional periodic structure to ensure the same transmission characteristics for horizontally and vertically polarized waves.

Keywords

antireflection coatings; dielectric materials; elemental semiconductors; micromachining; optical windows; periodic structures; permittivity; silicon; submillimetre waves; 2-dimensional periodic structure; 600 GHz; Si; antireflection coating; broad-band low loss window material; high-resistivity silicon wafer; horizontally polarized waves; low loss silicon window material; micromachined artificial dielectrics; micromachining; quarter wave transformer; submillimeter waves; vertically polarized waves; Coatings; Dielectric constant; Dielectric losses; Dielectric materials; Etching; Micromachining; Numerical analysis; Scanning electron microscopy; Silicon; Submillimeter wave technology;

fLanguage

English

Publisher

ieee

Conference_Titel

Infrared and Millimeter Waves, 2004 and 12th International Conference on Terahertz Electronics, 2004. Conference Digest of the 2004 Joint 29th International Conference on

Print_ISBN

0-7803-8490-3

Type

conf

DOI

10.1109/ICIMW.2004.1421975

Filename

1421975