• DocumentCode
    3052381
  • Title

    Stoichiometry-dependent vacancy formation in n-doped GaAs

  • Author

    Gebauer, J. ; Lausmann, M. ; Krause-Rehberg, R.

  • Author_Institution
    Fachbereich Phys., Martin-Luther-Univ., Halle-Wittenberg, Germany
  • fYear
    1998
  • fDate
    1998
  • Firstpage
    134
  • Lastpage
    137
  • Abstract
    The formation of vacancies in n-doped GaAs with variable stoichiometry was studied by means of positron annihilation. Highly Te-doped (n=1.5-5×1018 cm-3) GaAs samples were annealed at high temperatures under variable arsenic vapor pressure (pAs) and rapidly quenched to room temperature. We found that monovacancies exist in Te-doped GaAs regardless of the annealing conditions. In contrast, the vacancy concentration was found to be dependent on pAs, i.e. on the stoichiometry. The vacancy concentration increases like pAs1/4 and saturates at high As pressures (3-6 bar). This is a proof that the dominant vacancies in Te-doped As-rich GaAs are related to Ga vacancies, in agreement to theoretical results. Moreover, the vacancies were independently identified by using the Doppler broadening coincidence technique
  • Keywords
    Doppler broadening; III-V semiconductors; annealing; gallium arsenide; heavily doped semiconductors; positron annihilation; quenching (thermal); stoichiometry; tellurium; vacancies (crystal); 20 C; Doppler broadening coincidence technique; Ga vacancies; GaAs:Te; Te-doped GaAs; arsenic vapor pressure; highly Te-doped GaAs samples; monovacancies; n-doped GaAs; positron annihilation; rapid quenching; room temperature; stoichiometry; stoichiometry-dependent vacancy formation; vacancies; vacancy concentration; Annealing; Charge carrier density; Crystals; Furnaces; Gallium arsenide; Microscopy; Positrons; Pressure measurement; Temperature measurement; Thermodynamics;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconducting and Insulating Materials, 1998. (SIMC-X) Proceedings of the 10th Conference on
  • Conference_Location
    Berkeley, CA
  • Print_ISBN
    0-7803-4354-9
  • Type

    conf

  • DOI
    10.1109/SIM.1998.785093
  • Filename
    785093