• DocumentCode
    3053122
  • Title

    Investigations of population relaxation properties of hyperfine sublevels in 167Er3+ ions doped in a Y2SiO5 crystal

  • Author

    Hashimoto, Dieter ; Shimizu, Kazuo

  • Author_Institution
    NTT Basic Res. Labs., NTT Corp., Atsugi, Japan
  • fYear
    2013
  • fDate
    June 30 2013-July 4 2013
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We have established the lifetime t1 of the hyperfine sublevels of 167Er3+ ions in Y2SiO5 using spectral hole burning, measuring it as 37.8 + 8.9 ms at 2.25 K. Its temperature dependence varies as (1/T)n (n ~ 3).
  • Keywords
    erbium; optical hole burning; silicon compounds; yttrium compounds; Y2SiO5:167Er3+; hyperfine sublevels; population relaxation properties; spectral hole burning; temperature 2.25 K; Absorption; Ions; Optical pumping; Probes; Sociology; Statistics; Temperature measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics Pacific Rim (CLEO-PR), 2013 Conference on
  • Conference_Location
    Kyoto
  • Type

    conf

  • DOI
    10.1109/CLEOPR.2013.6599946
  • Filename
    6599946