Fabrication and optical property of two-dimensional infrared photonic crystals by deep reactive ion etching in Si

Author

Zhou, Mei ; Chen, Xiao-Shuang ; Zeng, Yong ; Xu, Jing ; Wang, Shaowei ; Lu, Wei

Author_Institution

Nat. Lab. for Infrared Phys., Chinese Acad. of Sci., Shanghai, China

fYear

2004

fDate

27 Sept.-1 Oct. 2004

Firstpage

183

Lastpage

184

Abstract

We report the fabrication and characterization of two-dimensional silicon-based photonic crystal structures realized by deep reactive ion etching method. Photonic crystals of square and triangular lattices with very high aspect ratios up to 33 have been achieved. Photonic bandgap behaviors are identified by the transmission and reflection spectra measured by using a Fourier transform infrared spectrometer. The experiment results are in good agreement with calculated band structures.

Keywords

Fourier transform spectra; band structure; crystal structure; elemental semiconductors; infrared spectra; lithography; photonic band gap; photonic crystals; silicon; sputter etching; Fourier transform infrared spectra; Si; band structures; deep reactive ion etching; optical property; photonic bandgap behaviors; photonic crystal fabrication; reflection spectra; silicon based photonic crystal structures; square lattices; transmission spectra; triangular lattices; two dimensional infrared photonic crystals; Etching; Fourier transforms; Infrared spectra; Lattices; Optical device fabrication; Optical reflection; Particle beam optics; Photonic band gap; Photonic crystals; Spectroscopy;

fLanguage

English

Publisher

ieee

Conference_Titel

Infrared and Millimeter Waves, 2004 and 12th International Conference on Terahertz Electronics, 2004. Conference Digest of the 2004 Joint 29th International Conference on

Print_ISBN

0-7803-8490-3

Type

conf

DOI

10.1109/ICIMW.2004.1422015

Filename

1422015