• DocumentCode
    3053986
  • Title

    Reduction of discrete-dopant-induced high-frequency characteristic fluctuations in nanoscale CMOS circuit

  • Author

    Li, Yiming ; Hwang, Chih-Hong ; Yeh, Ta-Ching ; Huang, Hsuan-Ming ; Li, Tien-Yeh ; Cheng, Hui-Wen

  • Author_Institution
    Dept. of Commun. Eng., Nat. Chiao Tung Univ., Hsinchu
  • fYear
    2008
  • fDate
    9-11 Sept. 2008
  • Firstpage
    209
  • Lastpage
    212
  • Abstract
    As the dimension of semiconductor device shrunk into nanoscale, characteristic fluctuation is more pronounced, and become crucial for circuit design. Diverse approaches have been reported to investigate and suppress the random-dopant-induced fluctuations in devices. However, attention is seldom drawn to the existence of high-frequency characteristic fluctuations of active device. In this paper, intrinsic high-frequency characteristic fluctuations of the nanoscale MOSFET circuit induced by random dopants are intensively explored using an experimentally validated simulation methodology, where fluctuation suppression technique is further examined. The circuit gain, the 3 db bandwidth and the unity-gain bandwidth of the tested circuit are estimated concurrently capturing the discrete-dopant-number-and discrete-dopant-position-induced fluctuations. This study provides an insight into discrete-dopant-induced intrinsic high-frequency characteristic fluctuations and examines the potential fluctuation suppression technique for nanoscale transistor circuit.
  • Keywords
    CMOS integrated circuits; MOSFET circuits; fluctuations; nanotechnology; network synthesis; transistor circuits; circuit design; discrete-dopant-induced high-frequency characteristic fluctuations; fluctuation suppression; nanoscale CMOS circuit; nanoscale MOSFET circuit; nanoscale transistor circuit; random-dopant-induced fluctuations; Bandwidth; Circuit simulation; Circuit synthesis; Circuit testing; Computational modeling; Doping profiles; Fluctuations; MOSFET circuits; Nanoscale devices; Semiconductor process modeling; Fluctuation; High Frequency Property; Modeling; Nanoscale MOSFETs; Random dopant; Simulation; Suppression;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices, 2008. SISPAD 2008. International Conference on
  • Conference_Location
    Hakone
  • Print_ISBN
    978-1-4244-1753-7
  • Type

    conf

  • DOI
    10.1109/SISPAD.2008.4648274
  • Filename
    4648274