Title :
Amorphous Si waveguides with high-quality stacked gratings for multi-layer Si optical circuits
Author :
Endo, T. ; Saiki, Koji ; Hiidome, Keita ; Tokushige, Hiroki ; Katsuyama, Tomokazu ; Takagi, Hiroyuki ; Morita, Minoru ; Ito, Yu ; Tsutsui, K. ; Wada, Yasuhiro ; Ikeda, N. ; Sugimoto, Yoshiki
Author_Institution :
Univ. of Fukui, Fukui, Japan
fDate :
June 30 2013-July 4 2013
Abstract :
Amorphous Si wire waveguides with stacked gratings are successfully fabricated by carefully controlling the SOG coating thickness. The peak energy of the light from the waveguide is controlled to be just 1.55 μm as designed.
Keywords :
amorphous semiconductors; diffraction gratings; elemental semiconductors; integrated optics; optical fabrication; optical waveguides; silicon; SOG coating thickness; amorphous waveguides; high-quality stacked gratings; multi-layer optical circuits; size 1.55 mum; Gratings; Optical device fabrication; Optical waveguides; Silicon; Wires;
Conference_Titel :
Lasers and Electro-Optics Pacific Rim (CLEO-PR), 2013 Conference on
Conference_Location :
Kyoto
DOI :
10.1109/CLEOPR.2013.6599992
