DocumentCode
3054548
Title
Three-dimensional topography simulation using advanced level set and ray tracing methods
Author
Ertl, Otmar ; Selberherr, Siegfried
Author_Institution
Inst. for Microelectron., Tech. Univ. Wien, Wien
fYear
2008
fDate
9-11 Sept. 2008
Firstpage
325
Lastpage
328
Abstract
We present new techniques for three-dimensional topography simulation of processes for which ballistic transport can be assumed at feature-scale. The combination of algorithms and data structures lent from the area of computer graphics allows a fast and memory saving solution of various deposition and etching processes.
Keywords
computer graphics; ray tracing; 3D topography simulation; advanced level set; ballistic transport; computer graphics; data structures; deposition processes; etching processes; ray tracing methods; Computational efficiency; Computational modeling; Data structures; Encoding; Geometry; Level set; Microelectronics; Narrowband; Ray tracing; Surface topography;
fLanguage
English
Publisher
ieee
Conference_Titel
Simulation of Semiconductor Processes and Devices, 2008. SISPAD 2008. International Conference on
Conference_Location
Hakone
Print_ISBN
978-1-4244-1753-7
Type
conf
DOI
10.1109/SISPAD.2008.4648303
Filename
4648303
Link To Document