DocumentCode :
3055169
Title :
Atomistic simulations for SiGe pMOS devices — Bandstructure to transport
Author :
Mehrotra, Saumitra R. ; Paul, Abhijeet ; Luisier, Mathieu ; Klimeck, Gerhard
Author_Institution :
Dept. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN, USA
fYear :
2009
fDate :
9-11 Dec. 2009
Firstpage :
1
Lastpage :
2
Abstract :
We have presented an atomistic approach for treating SiGe pMOSFET devices. A novel tight-binding bandstructure parametrization has been developed and validated for bulk SiGe. It has then been applied to ballistic simulation of quantum confined SiGe nanowire pMOS and compared to experimental result.
Keywords :
Ge-Si alloys; MOSFET; nanowires; SiGe pMOSFET device; atomistic simulation; ballistic simulation; bulk SiGe; quantum confined SiGe nanowire pMOS; tight-binding bandstructure parametrization; Capacitive sensors; Computational modeling; Effective mass; Electron devices; Germanium silicon alloys; MOS devices; MOSFETs; Nanoscale devices; Potential well; Silicon germanium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Device Research Symposium, 2009. ISDRS '09. International
Conference_Location :
College Park, MD
Print_ISBN :
978-1-4244-6030-4
Electronic_ISBN :
978-1-4244-6031-1
Type :
conf
DOI :
10.1109/ISDRS.2009.5378065
Filename :
5378065
Link To Document :
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