DocumentCode
3055202
Title
Resistive switching characteristics of solution-processible TiOx using nano-scale via-hole structures
Author
Jung, Seungjae ; Kim, Tae-Wook ; Choi, Hyejung ; Kong, Jaemin ; Park, Ju-Bong ; Jo, Minseok ; Kim, Seonghyun ; Lee, Wootae ; Lee, Joonmyoung ; Lee, Takhee ; Lee, Kwanghee ; Hwang, Hyunsang
Author_Institution
Dept. of Mater. Sci. & Eng., Gwangju Inst. of Sci. & Technol. (GIST), Gwangju, South Korea
fYear
2009
fDate
9-11 Dec. 2009
Firstpage
1
Lastpage
2
Abstract
In this study, we successfully demonstrated ReRAM device with active area below 1 ¿m2, using solution-processed TiO¿ in via-hole structures.
Keywords
random-access storage; titanium compounds; TiO; nano-scale via-hole structures; resistive switching characteristics; Degradation; Educational institutions; Electronic equipment testing; Inorganic materials; Materials science and technology; Nanoscale devices; Nanostructured materials; Nanostructures; Nonvolatile memory; Temperature measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Device Research Symposium, 2009. ISDRS '09. International
Conference_Location
College Park, MD
Print_ISBN
978-1-4244-6030-4
Electronic_ISBN
978-1-4244-6031-1
Type
conf
DOI
10.1109/ISDRS.2009.5378068
Filename
5378068
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