DocumentCode
3055487
Title
Nanotube/nanorods fabrication of ZnO using atomic layer deposition and the template replication method
Author
Gu, D. ; Tapily, K. ; Shrestha, P. ; Baumgart, H.
Author_Institution
Appl. Res. Center, Old Dominion Univ., Newport News, VA, USA
fYear
2009
fDate
9-11 Dec. 2009
Firstpage
1
Lastpage
2
Abstract
In this study, ZnO thin films were deposited by ALD at low temperature using diethyl zinc (DEZn) and water precursors and were characterized by various techniques. ZnO tubes and rods were obtained using ALD and template replication method.
Keywords
II-VI semiconductors; atomic layer deposition; nanofabrication; nanorods; replica techniques; semiconductor growth; semiconductor nanotubes; semiconductor thin films; zinc compounds; ALD; ZnO; atomic layer deposition; diethyl zinc; nanorods; nanotube; replication; semiconductor thin films; template replication method; Annealing; Atomic layer deposition; Fabrication; Grain size; Rough surfaces; Surface fitting; Surface morphology; Surface roughness; Temperature; Zinc oxide;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Device Research Symposium, 2009. ISDRS '09. International
Conference_Location
College Park, MD
Print_ISBN
978-1-4244-6030-4
Electronic_ISBN
978-1-4244-6031-1
Type
conf
DOI
10.1109/ISDRS.2009.5378084
Filename
5378084
Link To Document