Title :
Deep UV mastering using an all-solid-state 266 nm laser for an over 14 Gb/in/sup 2/
Author :
Furuki, M. ; Takeda, M. ; Yamatsu, H.
Author_Institution :
Giga Byte Labs., Sony Corp., Tokyo, Japan
Abstract :
The deep UV mastering process of the next generation high-density disk is demonstrated using an all-solid-state CW 266 nm laser for the first time. We achieved a density of over 14 Gbit/in/sup 2/ with acceptable jitter using both novolak type resist and chemically amplified resist.
Keywords :
jitter; laser beam etching; optical disc storage; photoresists; solid lasers; 266 nm; all-solid-state CW 266 nm laser; chemically amplified resist; deep UV mastering; density; jitter; next generation high-density disk; novolak type resist; Chemical lasers; Diode lasers; Gas lasers; Lenses; Optical films; Optical harmonic generation; Optical modulation; Optical recording; Particle beam optics; Resists;
Conference_Titel :
Consumer Electronics, 1999. ICCE. International Conference on
Conference_Location :
Los Angeles, CA, USA
Print_ISBN :
0-7803-5123-1
DOI :
10.1109/ICCE.1999.785260
