• DocumentCode
    3055903
  • Title

    Modeling the threshold voltage of ultra-thin-body(UTB) long channel symmetric double-gate (DG) MOSFETs

  • Author

    Medury, AdityaSankar ; Majumdar, Kausik ; Bhat, Navakanta ; Bhat, K.N.

  • Author_Institution
    Dept. of Electr. & Commun. Eng., Indian Inst. of Sci., Bangalore, India
  • fYear
    2009
  • fDate
    9-11 Dec. 2009
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    The authors define the threshold voltage of undoped-body UTB DG MOSFET as the gate voltage at which the mid-channel (center of the film) potential begins to saturate. A center potential based approach is proposed to determine the threshold voltage which is quite physical, as the centroid of the inversion layer charge is closer to the center of the silicon film for UTB devices of the film thickness range considered (1-20 nm). It is shown that this model is valid for both classical and quantum cases. Also, by using a rigorous numerical solution as the basis of the approach, they are able to obtain an accurate definition of the threshold voltage, taking quantum effects into account.
  • Keywords
    MOSFET; elemental semiconductors; semiconductor device models; semiconductor thin films; silicon; double-gate MOSFET; gate voltage; long channel symmetric MOSFET; midchannel film potential; numerical solution basis; quantum effects; silicon film thickness; size 1 nm to 20 nm; threshold voltage modeling; ultrathin-body MOSFET; MOSFETs; Microelectronics; Nanoscale devices; Poisson equations; Potential well; Quantization; Semiconductor device reliability; Semiconductor films; Silicon; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Device Research Symposium, 2009. ISDRS '09. International
  • Conference_Location
    College Park, MD
  • Print_ISBN
    978-1-4244-6030-4
  • Electronic_ISBN
    978-1-4244-6031-1
  • Type

    conf

  • DOI
    10.1109/ISDRS.2009.5378101
  • Filename
    5378101