DocumentCode
3055903
Title
Modeling the threshold voltage of ultra-thin-body(UTB) long channel symmetric double-gate (DG) MOSFETs
Author
Medury, AdityaSankar ; Majumdar, Kausik ; Bhat, Navakanta ; Bhat, K.N.
Author_Institution
Dept. of Electr. & Commun. Eng., Indian Inst. of Sci., Bangalore, India
fYear
2009
fDate
9-11 Dec. 2009
Firstpage
1
Lastpage
2
Abstract
The authors define the threshold voltage of undoped-body UTB DG MOSFET as the gate voltage at which the mid-channel (center of the film) potential begins to saturate. A center potential based approach is proposed to determine the threshold voltage which is quite physical, as the centroid of the inversion layer charge is closer to the center of the silicon film for UTB devices of the film thickness range considered (1-20 nm). It is shown that this model is valid for both classical and quantum cases. Also, by using a rigorous numerical solution as the basis of the approach, they are able to obtain an accurate definition of the threshold voltage, taking quantum effects into account.
Keywords
MOSFET; elemental semiconductors; semiconductor device models; semiconductor thin films; silicon; double-gate MOSFET; gate voltage; long channel symmetric MOSFET; midchannel film potential; numerical solution basis; quantum effects; silicon film thickness; size 1 nm to 20 nm; threshold voltage modeling; ultrathin-body MOSFET; MOSFETs; Microelectronics; Nanoscale devices; Poisson equations; Potential well; Quantization; Semiconductor device reliability; Semiconductor films; Silicon; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Device Research Symposium, 2009. ISDRS '09. International
Conference_Location
College Park, MD
Print_ISBN
978-1-4244-6030-4
Electronic_ISBN
978-1-4244-6031-1
Type
conf
DOI
10.1109/ISDRS.2009.5378101
Filename
5378101
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