Title :
Mechanical characterization of SiLK by nanoindentation and substrate curvature techniques
Author :
Gonda, V. ; Jansen, K.M.B. ; Ernst, L.J. ; den Toonder, J. ; Zhang, G.Q.
Author_Institution :
DIMES, Delft Univ. of Technol., Netherlands
Abstract :
Advanced micro mechanical characterization methods provide material properties of thin films for modelling thermo mechanical behavior of thin films for microelectronic applications. Here we focus on the local measurement method of nanoindentation for finding visco-elastic properties, and a global method of substrate curvature testing that provides linear elastic properties. Our specimen of SiLK, Dow Chemicals, is a thin polymer film with a thickness of 400 nm and also 8 μm, deposited on a Si substrate. Our results show temperature dependent linear elastic and linear visco-elastic material properties for thin film materials.
Keywords :
dielectric thin films; elastic moduli; indentation; materials testing; polymer films; viscoelasticity; 400 nm; 8 micron; SiLK; Young´s modulus; elastic modulus; hardness; linear elastic properties; micro mechanical characterization methods; nanoindentation; polymer thin film thermo mechanical behavior; stress measurement; substrate curvature techniques; visco-elastic properties; Elasticity; Laboratories; Material properties; Polymer films; Semiconductor films; Silicon; Substrates; Testing; Transistors; Viscosity;
Conference_Titel :
Thermal and Mechanical Simulation and Experiments in Microelectronics and Microsystems, 2004. EuroSimE 2004. Proceedings of the 5th International Conference on
Print_ISBN :
0-7803-8420-2
DOI :
10.1109/ESIME.2004.1304066