DocumentCode
3056114
Title
Mechanical characterization of SiLK by nanoindentation and substrate curvature techniques
Author
Gonda, V. ; Jansen, K.M.B. ; Ernst, L.J. ; den Toonder, J. ; Zhang, G.Q.
Author_Institution
DIMES, Delft Univ. of Technol., Netherlands
fYear
2004
fDate
2004
Firstpage
373
Lastpage
376
Abstract
Advanced micro mechanical characterization methods provide material properties of thin films for modelling thermo mechanical behavior of thin films for microelectronic applications. Here we focus on the local measurement method of nanoindentation for finding visco-elastic properties, and a global method of substrate curvature testing that provides linear elastic properties. Our specimen of SiLK, Dow Chemicals, is a thin polymer film with a thickness of 400 nm and also 8 μm, deposited on a Si substrate. Our results show temperature dependent linear elastic and linear visco-elastic material properties for thin film materials.
Keywords
dielectric thin films; elastic moduli; indentation; materials testing; polymer films; viscoelasticity; 400 nm; 8 micron; SiLK; Young´s modulus; elastic modulus; hardness; linear elastic properties; micro mechanical characterization methods; nanoindentation; polymer thin film thermo mechanical behavior; stress measurement; substrate curvature techniques; visco-elastic properties; Elasticity; Laboratories; Material properties; Polymer films; Semiconductor films; Silicon; Substrates; Testing; Transistors; Viscosity;
fLanguage
English
Publisher
ieee
Conference_Titel
Thermal and Mechanical Simulation and Experiments in Microelectronics and Microsystems, 2004. EuroSimE 2004. Proceedings of the 5th International Conference on
Print_ISBN
0-7803-8420-2
Type
conf
DOI
10.1109/ESIME.2004.1304066
Filename
1304066
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