• DocumentCode
    3056666
  • Title

    Semiconductor-dielectric interfacial study using spectral-spatial photocurrent probes and 1/f noise probe in organic field effect transistors

  • Author

    Jia, Zhang ; Meri, Inanc ; Shepard, Kenneth ; Kymissis, Ioannis

  • Author_Institution
    Columbia Univ. in the City of New York, New York, NY, USA
  • fYear
    2009
  • fDate
    9-11 Dec. 2009
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    Organic field effect transistors (OFETs) are sensitive to the chemistry of the gate dielectric/semiconductor boundary both during and after fabrication. In particular, surface states can be introduced on polymer gate dielectrics that shift the threshold voltage if the dielectric layer is exposed to oxidizing agents prior to semiconductor deposition. To understand the interfacial properties can not only benefit practical applications but also further the understanding of transport mechanism in OFETs.
  • Keywords
    1/f noise; coating techniques; dielectric properties; organic field effect transistors; photoconductivity; 1/f noise probe; fabrication; gate dielectric/semiconductor boundary; organic field effect transistors; polymer gate dielectrics; semiconductor deposition; semiconductor-dielectric interfacial study; spectral-spatial photocurrent probes; Chemistry; Dielectrics; Fabrication; Mechanical factors; OFETs; Photoconductivity; Polymers; Probes; Semiconductor device noise; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Device Research Symposium, 2009. ISDRS '09. International
  • Conference_Location
    College Park, MD
  • Print_ISBN
    978-1-4244-6030-4
  • Electronic_ISBN
    978-1-4244-6031-1
  • Type

    conf

  • DOI
    10.1109/ISDRS.2009.5378133
  • Filename
    5378133