DocumentCode :
3057302
Title :
Complementary oxide memristor technology facilitating both inhibitory and excitatory synapses for potential neuromorphic computing applications
Author :
Doolittle, W. Alan ; Calley, W. Laws ; Henderson, Walter
Author_Institution :
Sch. of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
fYear :
2009
fDate :
9-11 Dec. 2009
Firstpage :
1
Lastpage :
2
Abstract :
A new family of crystalline oxides is identified that provide a method of producing complementary memristance (both n and p-type having been demonstrated) with unusually large demonstrated memristance behavior. To the best of our knowledge, these are the only devices having a large enough memristance to have measureable memristance at the macroscopic (10´s to 100´s of um device size) scale. Additionally, the oxides are highly conducting (low loss) with resistivities for both n and p-type variants in the -5E-4 ohm-cm range. Complementary oxide memristors (both n-type and p-type) have been demonstrated in the same material contrasting all other known memristor technologies which are unipolar. Such behavior could be useful in future neuromorphic computing since n-type material exhibits inhibitory synaptic response (increasing resistance with time/voltage) while p-type material exhibits excitatory synaptic response (decreasing resistance with time/voltage). In principle (not yet demonstrated) this core complementary technology can fully implement neuron/synapse brain function without the need for traditional CMOS.
Keywords :
memristors; complementary oxide memristor; crystalline oxides; excitatory synapse response; inhibitory synapse response; neuron/synapse brain function; potential neuromorphic computing; CMOS technology; Computer applications; Conducting materials; Conductivity; Crystallization; Memristors; Neuromorphics; Neurons; Size measurement; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Device Research Symposium, 2009. ISDRS '09. International
Conference_Location :
College Park, MD
Print_ISBN :
978-1-4244-6030-4
Electronic_ISBN :
978-1-4244-6031-1
Type :
conf
DOI :
10.1109/ISDRS.2009.5378162
Filename :
5378162
Link To Document :
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