• DocumentCode
    3057302
  • Title

    Complementary oxide memristor technology facilitating both inhibitory and excitatory synapses for potential neuromorphic computing applications

  • Author

    Doolittle, W. Alan ; Calley, W. Laws ; Henderson, Walter

  • Author_Institution
    Sch. of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
  • fYear
    2009
  • fDate
    9-11 Dec. 2009
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    A new family of crystalline oxides is identified that provide a method of producing complementary memristance (both n and p-type having been demonstrated) with unusually large demonstrated memristance behavior. To the best of our knowledge, these are the only devices having a large enough memristance to have measureable memristance at the macroscopic (10´s to 100´s of um device size) scale. Additionally, the oxides are highly conducting (low loss) with resistivities for both n and p-type variants in the -5E-4 ohm-cm range. Complementary oxide memristors (both n-type and p-type) have been demonstrated in the same material contrasting all other known memristor technologies which are unipolar. Such behavior could be useful in future neuromorphic computing since n-type material exhibits inhibitory synaptic response (increasing resistance with time/voltage) while p-type material exhibits excitatory synaptic response (decreasing resistance with time/voltage). In principle (not yet demonstrated) this core complementary technology can fully implement neuron/synapse brain function without the need for traditional CMOS.
  • Keywords
    memristors; complementary oxide memristor; crystalline oxides; excitatory synapse response; inhibitory synapse response; neuron/synapse brain function; potential neuromorphic computing; CMOS technology; Computer applications; Conducting materials; Conductivity; Crystallization; Memristors; Neuromorphics; Neurons; Size measurement; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Device Research Symposium, 2009. ISDRS '09. International
  • Conference_Location
    College Park, MD
  • Print_ISBN
    978-1-4244-6030-4
  • Electronic_ISBN
    978-1-4244-6031-1
  • Type

    conf

  • DOI
    10.1109/ISDRS.2009.5378162
  • Filename
    5378162