• DocumentCode
    3057430
  • Title

    An electrostatic quality factor control for surface-micromachined lateral resonators

  • Author

    Lee, Ki Bang ; Cho, Young-Ho

  • Author_Institution
    Dept. of Mech. Eng., Korea Adv. Inst. of Sci. & Technol., Seoul, South Korea
  • fYear
    1996
  • fDate
    2-4 Oct 1996
  • Firstpage
    143
  • Lastpage
    147
  • Abstract
    We present and apply a quality factor control method for laterally driven micromechanical resonant microstructures. The present method modifies the thickness of air-damping gap by applying an electrostatic force between the planar resonant microstructure and ground plane; thereby adjusting the quality factor of the microresonators after fabrication. Polysilicon resonators have been designed and fabricated by a 4-mask surface-micromachining process. The present method reduces the quality factor of the fabricated resonator at the rate of 120/V by applying the electrostatic voltage in the range of 1.75~2.25 V. The maximum 50% reduction of the quality factor has been achieved at the electrostatic voltage of 2.25 V
  • Keywords
    Q-factor; electrostatic devices; elemental semiconductors; masks; micromachining; micromechanical resonators; silicon; 1.75 to 2.25 V; Si; air-damping gap; electrostatic force; electrostatic quality factor control; electrostatic voltage; four-mask surface-micromachining process; laterally driven micromechanical resonant microstructures; polysilicon resonators; quality factor; surface-micromachined lateral resonators; Damping; Electrostatic analysis; Fabrication; Microcavities; Micromechanical devices; Microstructure; Q factor; Resonance; Temperature sensors; Voltage control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Machine and Human Science, 1996., Proceedings of the Seventh International Symposium
  • Conference_Location
    Nagoya
  • Print_ISBN
    0-7803-3596-1
  • Type

    conf

  • DOI
    10.1109/MHS.1996.563415
  • Filename
    563415