DocumentCode
3059580
Title
Low temperature hot-wire polysilicon waveguides
Author
Ben Masaud, T.M. ; Tarazona, A. ; Xia Chen ; Reed, Gregory F. ; Chong, H.M.H.
Author_Institution
Electron. & Comput. Sci., Univ. of Southampton, Southampton, UK
fYear
2013
fDate
June 30 2013-July 4 2013
Firstpage
1
Lastpage
2
Abstract
We fabricated and measured low loss polysilicon waveguides deposited using Hot-Wire Chemical Vapor Deposition (HWCVD) at 240°C. The optical propagation loss was measured to be 11.9 dB/cm at λ = 1550 nm.
Keywords
chemical vapour deposition; elemental semiconductors; optical fabrication; optical losses; optical waveguides; silicon; HWCVD; Si; hot-wire chemical vapor deposition; low loss polysilicon waveguides; low temperature hot-wire polysilicon waveguides; optical propagation loss; temperature 240 degC; wavelength 1550 nm; Chemical vapor deposition; Optical losses; Optical waveguides; Plasma temperature; Propagation losses; Silicon; Waveguide lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Pacific Rim (CLEO-PR), 2013 Conference on
Conference_Location
Kyoto
Type
conf
DOI
10.1109/CLEOPR.2013.6600238
Filename
6600238
Link To Document