What triggers NBTI? An “on the fly” electron spin resonance approach

A fundamental understanding of the physical processes involved in the negative bias temperature instability (NBTI) has yet to be established. In this study, we have developed an "on the fly" approach to magnetic resonance in which ESR measurements are performed during negative bias stressing of MOS structures at elevated temperature. Our results clearly demonstrate E\´ center generation during NBTI stressing. The E\´ center signals disappear upon removal of stress conditions, suggesting the E\´ centers generated during stress recover quickly.