Title :
Ultraviolet-induced wavelength trimming of BCB-buried athermal Si slot wavelength filters
Author :
Atsumi, Yuki ; Sifer, Takeshi ; JoonHyun Kang ; Hayashi, Yasuhiro ; Nishiyama, Naoto ; Arai, Shigehisa
Author_Institution :
Dept. of Electr. & Electron. Eng., Tokyo Inst. of Technol., Tokyo, Japan
fDate :
June 30 2013-July 4 2013
Abstract :
Wavelength trimming for athermal Si slot wavelength filter embedded with BCB using DUV exposure was demonstrated. The total shift of 1.21 nm was obtained after exposing 14 J/cm2 of DUV light without any degradation in athermal and propagation characteristics.
Keywords :
elemental semiconductors; light propagation; optical filters; organic compounds; silicon; BCB-buried athermal slot wavelength filters; DUV exposure; DUV light; Si; benzocyclobutene; propagation characteristics; ultraviolet-induced wavelength trimming; Optical filters; Optical refraction; Optical ring resonators; Optical variables control; Optical waveguides; Resonator filters; Silicon;
Conference_Titel :
Lasers and Electro-Optics Pacific Rim (CLEO-PR), 2013 Conference on
Conference_Location :
Kyoto
DOI :
10.1109/CLEOPR.2013.6600264
