• DocumentCode
    3060392
  • Title

    High-temperature modeling of AlGaN/GaN HEMTs

  • Author

    Vitanov, Stanislav ; Palankovski, Vassil ; Maroldt, Stephan ; Quay, Rüdiger

  • Author_Institution
    Adv. Mater. & Device Anal. Group, Tech. Univ. Wien, Vienna, Austria
  • fYear
    2009
  • fDate
    9-11 Dec. 2009
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Wide bandgap, high saturation velocity, and high thermal stability are some of the properties of GaN, which make it an excellent material for high-power, high frequency, and high temperature applications. Given the predicted wide-spread use, reliable models are needed for simulationbased optimization. As several application areas require the devices to operate at elevated temperatures, a proper modeling of the temperature dependences of the band structure and transport parameters is highly important. We present two-dimensional hydrodynamic simulations of AlGaN/GaN high electron mobility transistors (HEMTs) supported by measured data at high temperatures.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; thermal stability; wide band gap semiconductors; AlGaN-GaN; HEMT; band structure; high frequency applications; high saturation velocity; high temperature applications; high thermal stability; high-temperature modeling; transport parameters; wide bandgap; Aluminum gallium nitride; Frequency; Gallium nitride; HEMTs; Hydrodynamics; MODFETs; Photonic band gap; Predictive models; Temperature dependence; Thermal stability;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Device Research Symposium, 2009. ISDRS '09. International
  • Conference_Location
    College Park, MD
  • Print_ISBN
    978-1-4244-6030-4
  • Electronic_ISBN
    978-1-4244-6031-1
  • Type

    conf

  • DOI
    10.1109/ISDRS.2009.5378300
  • Filename
    5378300