DocumentCode
3060392
Title
High-temperature modeling of AlGaN/GaN HEMTs
Author
Vitanov, Stanislav ; Palankovski, Vassil ; Maroldt, Stephan ; Quay, Rüdiger
Author_Institution
Adv. Mater. & Device Anal. Group, Tech. Univ. Wien, Vienna, Austria
fYear
2009
fDate
9-11 Dec. 2009
Firstpage
1
Lastpage
2
Abstract
Wide bandgap, high saturation velocity, and high thermal stability are some of the properties of GaN, which make it an excellent material for high-power, high frequency, and high temperature applications. Given the predicted wide-spread use, reliable models are needed for simulationbased optimization. As several application areas require the devices to operate at elevated temperatures, a proper modeling of the temperature dependences of the band structure and transport parameters is highly important. We present two-dimensional hydrodynamic simulations of AlGaN/GaN high electron mobility transistors (HEMTs) supported by measured data at high temperatures.
Keywords
III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; thermal stability; wide band gap semiconductors; AlGaN-GaN; HEMT; band structure; high frequency applications; high saturation velocity; high temperature applications; high thermal stability; high-temperature modeling; transport parameters; wide bandgap; Aluminum gallium nitride; Frequency; Gallium nitride; HEMTs; Hydrodynamics; MODFETs; Photonic band gap; Predictive models; Temperature dependence; Thermal stability;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Device Research Symposium, 2009. ISDRS '09. International
Conference_Location
College Park, MD
Print_ISBN
978-1-4244-6030-4
Electronic_ISBN
978-1-4244-6031-1
Type
conf
DOI
10.1109/ISDRS.2009.5378300
Filename
5378300
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