Title :
Investigation of the drain current shift in ZnO thin film transistors
Author :
Abdel-Motaleb, Ibrahim M. ; Shetty, Neeraj ; Leedy, Kevin ; Cortez, Rebecca
Author_Institution :
Dept. of Electr. Eng., Northern Illinois Univ., De Kalb, IL, USA
Abstract :
The combinational properties of ZnO of hardness to visible light, transparency, low temperature deposition, high mobility, and the ability to crystallize on almost any substrate enables ZnO thin film transistors (TFTs) to be promising low-cost optoelectronic devices for the next generation of invisible and flexible electronics, such as switches for addressing active matrices based on organic light-emitting diodes. Using high-K dielectrics in ZnO TFTs substantially increases its transconductance, gm. Using barium strontium titanate (BST) may result in the increase of gm by more than 200 times it value if SiO2 is used.
Keywords :
II-VI semiconductors; barium compounds; high-k dielectric thin films; optoelectronic devices; organic light emitting diodes; silicon compounds; strontium compounds; thin film transistors; wide band gap semiconductors; BST; SiO2; TFT; ZnO; active matrices; drain current shift; flexible electronics; high-K dielectrics; invisible electronics; low temperature deposition; optoelectronic devices; organic light-emitting diodes; switches; thin film transistors; Active matrix addressing; Active matrix organic light emitting diodes; Crystallization; Dielectric substrates; Flexible electronics; Optoelectronic devices; Switches; Temperature; Thin film transistors; Zinc oxide;
Conference_Titel :
Semiconductor Device Research Symposium, 2009. ISDRS '09. International
Conference_Location :
College Park, MD
Print_ISBN :
978-1-4244-6030-4
Electronic_ISBN :
978-1-4244-6031-1
DOI :
10.1109/ISDRS.2009.5378327