DocumentCode :
3060920
Title :
Fermi level depinning of Ge Schottky contacts using single crystalline MgO
Author :
Zhou, Yi ; Han, Wei ; Wang, Yong ; Xiu, Faxian ; Zou, Jin ; Kawakami, R.K. ; Wang, K.L.
Author_Institution :
Electr. Eng. Dept., Univ. of California at Los Angeles, Los Angeles, CA, USA
fYear :
2009
fDate :
9-11 Dec. 2009
Firstpage :
1
Lastpage :
2
Abstract :
The authors investigated the origin of FL pinning in Ge Schottky junctions by characterizing the Fe/MgO/n-Ge junctions with single-crystalline and atomically smooth MgO epitaxially grown on Ge. The weak dependence of the SBH on the MgO thickness suggests that the surface states due to native defects on the Ge surface are likely to play the dominant role in the FL pinning. Further evidence is given by the fact that passivating the surface dangling bonds with aqueous (NH4)2S solution depins the FL more effectively than inserting the MgO films, which would have been the opposite if MIGS were to play the dominant role.
Keywords :
Fermi level; II-VI semiconductors; Schottky barriers; epitaxial growth; germanium; magnesium compounds; surface states; wide band gap semiconductors; (NH4)2S; Fe-MgO-Ge; Fermi level depinning; Ge Schottky contacts; Ge Schottky junctions; Schottky barrier height; epitaxial growth; metal induced gap states; single crystalline MgO; surface dangling bonds; surface states; Atomic force microscopy; Crystallization; Displays; Electrons; Insulation; Iron; Schottky barriers; Surface morphology; Surface treatment; Wave functions;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Device Research Symposium, 2009. ISDRS '09. International
Conference_Location :
College Park, MD
Print_ISBN :
978-1-4244-6030-4
Electronic_ISBN :
978-1-4244-6031-1
Type :
conf
DOI :
10.1109/ISDRS.2009.5378328
Filename :
5378328
Link To Document :
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