• DocumentCode
    3063173
  • Title

    InP heterostructure photonic crystal waveguide fabricated by high-aspect-ratio ICP etching

  • Author

    Kaiyu Cui ; Yongzhuo Li ; Xue Feng ; Fang Liu ; Yidong Huang ; Wei Zhang

  • Author_Institution
    Dept. of Electron. Eng., Tsinghua Univ., Beijing, China
  • fYear
    2013
  • fDate
    June 30 2013-July 4 2013
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    InP heterostructure photonic crystal waveguide (PCW) is fabricated by ICP etching with high-aspect-ratio of 45. Structure-dependent transmission-dip about 17dB and micro-photoluminescence linewidth of only 73nm are demonstrated in a 17μm-long heterostructure PCW.
  • Keywords
    III-V semiconductors; etching; optical fabrication; optical waveguides; photoluminescence; photonic crystals; InP; high-aspect-ratio ICP etching; micro-photoluminescence; photonic crystal waveguide; wavelength 73 nm; Etching; Indium phosphide; Integrated optics; Iterative closest point algorithm; Optical device fabrication; Optical waveguides; Photonic crystals;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics Pacific Rim (CLEO-PR), 2013 Conference on
  • Conference_Location
    Kyoto
  • Type

    conf

  • DOI
    10.1109/CLEOPR.2013.6600391
  • Filename
    6600391
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3063173