DocumentCode :
3063414
Title :
High-power millimeter waves applications in plasmas and industrial technologies
Author :
Litvak, A.G.
Author_Institution :
Inst. of Appl. Phys., Acad. of Sci., Nizhny Novgorod, Russia
fYear :
2004
fDate :
27 Sept.-1 Oct. 2004
Firstpage :
827
Lastpage :
828
Abstract :
Creation of gyrotrons reveals new possibilities for development of efficient tools for scientific experiments and promising technologies for industrial material processing. The presentation reviews physical basics of gyrotron applications including plasma heating and current drive in magnetic fusion setups, creation of sources of dense plasma and beams of multi-charge ions, deposition of polycrystalline diamond films by the CVD method, nanoceramic sintering, and annealing of semiconductor structures.
Keywords :
annealing; chemical vapour deposition; diamond; elemental semiconductors; gyrotrons; high-frequency discharges; plasma Bernstein waves; plasma confinement; plasma radiofrequency heating; plasma sources; silicon; sintering; submillimetre wave tubes; thin films; C; CVD method; Si; gyrotrons; high power millimeter waves; industrial material processing; magnetic fusion; multicharge ions; nanoceramic sintering; plasma applications; plasma heating; plasma sources; polycrystalline diamond films; semiconductor structure; Gyrotrons; Heating; Magnetic semiconductors; Materials processing; Millimeter wave technology; Plasma applications; Plasma density; Plasma materials processing; Plasma sources; Plasma waves;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Infrared and Millimeter Waves, 2004 and 12th International Conference on Terahertz Electronics, 2004. Conference Digest of the 2004 Joint 29th International Conference on
Print_ISBN :
0-7803-8490-3
Type :
conf
DOI :
10.1109/ICIMW.2004.1422350
Filename :
1422350
Link To Document :
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