DocumentCode
3066509
Title
Modeling and correlation of gate oxide QBD between exponential current ramp and constant current stresses
Author
Liu, Chuan H. ; Cheng, Tun-Jen ; Wang, Mu-Chun ; Yang, S.H. ; Fu, K.Y.
Author_Institution
United Microelectron. Corp., Hsin-Chu, Taiwan
fYear
1999
fDate
1999
Firstpage
94
Lastpage
95
Abstract
A simple model and conversion scheme is proposed to correlate Q BD measured through exponential current ramp stress (ECR) and constant current stress (CCS). Although QBD measured via ECR depends on holding time (a power-law dependence) and so does CCS on current density (also a power-law dependence), results from either test at any stress condition can be easily converted to the other with stress condition specified. Experiments with 35 Å to 135 Å oxides demonstrate the capability of the proposed method
Keywords
charge injection; current density; dielectric thin films; electric breakdown; impact ionisation; oxidation; semiconductor process modelling; 35 to 135 angstrom; constant current stresses; correlation; current density; exponential current ramp stress; gate oxide QBD; gate oxide charge-to-breakdown; holding time; impact ionization; model; negative gate injection; oxide thickness; positive gate injection; power-law dependence; Carbon capture and storage; Current density; Delay effects; Design for quality; Size measurement; Stress measurement; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, Systems, and Applications, 1999. International Symposium on
Conference_Location
Taipei
ISSN
1524-766X
Print_ISBN
0-7803-5620-9
Type
conf
DOI
10.1109/VTSA.1999.786008
Filename
786008
Link To Document