• DocumentCode
    3066509
  • Title

    Modeling and correlation of gate oxide QBD between exponential current ramp and constant current stresses

  • Author

    Liu, Chuan H. ; Cheng, Tun-Jen ; Wang, Mu-Chun ; Yang, S.H. ; Fu, K.Y.

  • Author_Institution
    United Microelectron. Corp., Hsin-Chu, Taiwan
  • fYear
    1999
  • fDate
    1999
  • Firstpage
    94
  • Lastpage
    95
  • Abstract
    A simple model and conversion scheme is proposed to correlate Q BD measured through exponential current ramp stress (ECR) and constant current stress (CCS). Although QBD measured via ECR depends on holding time (a power-law dependence) and so does CCS on current density (also a power-law dependence), results from either test at any stress condition can be easily converted to the other with stress condition specified. Experiments with 35 Å to 135 Å oxides demonstrate the capability of the proposed method
  • Keywords
    charge injection; current density; dielectric thin films; electric breakdown; impact ionisation; oxidation; semiconductor process modelling; 35 to 135 angstrom; constant current stresses; correlation; current density; exponential current ramp stress; gate oxide QBD; gate oxide charge-to-breakdown; holding time; impact ionization; model; negative gate injection; oxide thickness; positive gate injection; power-law dependence; Carbon capture and storage; Current density; Delay effects; Design for quality; Size measurement; Stress measurement; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, Systems, and Applications, 1999. International Symposium on
  • Conference_Location
    Taipei
  • ISSN
    1524-766X
  • Print_ISBN
    0-7803-5620-9
  • Type

    conf

  • DOI
    10.1109/VTSA.1999.786008
  • Filename
    786008