• DocumentCode
    3066797
  • Title

    Non-destructive Prognosis Method Of Oxide Degradation- A Rapid Monitoring Of Oxide Energy Band Changes Cause By Semiconductor Processing

  • Author

    Aum, Paul K. ; Dao, Thuy

  • Author_Institution
    Spider Systems Inc.
  • fYear
    1996
  • fDate
    13-14 May 1996
  • Firstpage
    15
  • Lastpage
    19
  • Keywords
    Breakdown voltage; Degradation; Electric breakdown; Insulation; Monitoring; Plasma applications; Plasma devices; Plasma materials processing; Plasma measurements; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Process-Induced Damage, 1996 1st International Symposium on
  • Print_ISBN
    0-9651577-0-9
  • Type

    conf

  • DOI
    10.1109/PPID.1996.715193
  • Filename
    715193
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3066797