DocumentCode
3067510
Title
Quantifying Wafer Charging During Via Etch
Author
Lukaszek, Wes ; Birrell, Andrew H.
Author_Institution
Wafer Charging Monitors, Inc.
fYear
1996
fDate
13-14 May 1996
Firstpage
30
Lastpage
33
Keywords
Charge measurement; Current measurement; EPROM; Etching; Resists; Sensor phenomena and characterization; Surface charging; Testing; Threshold voltage; Vehicles;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Process-Induced Damage, 1996 1st International Symposium on
Print_ISBN
0-9651577-0-9
Type
conf
DOI
10.1109/PPID.1996.715196
Filename
715196
Link To Document