• DocumentCode
    3067652
  • Title

    Room-temperature continuous-wave lasing from InAs/GaAs quantum dot laser grown by molecular beam epitaxy

  • Author

    Gong, Q. ; Liang, J.B. ; Xu, B. ; Wang, Z.G.

  • Author_Institution
    Lab. of Semicond. Mater. Sci., Acad. Sinica, Beijing, China
  • fYear
    1998
  • fDate
    1998
  • Firstpage
    705
  • Lastpage
    706
  • Abstract
    Quantum dot lasers are predicted to have proved lasing characteristics compared to quantum well and quantum wire lasers. We report on quantum dot lasers with active media of vertically stacked InAs quantum dot layers grown by molecular beam epitaxy. The laser diodes were fabricated and the threshold current density of 220 A/cm2 was achieved at room temperature with lasing wavelength of 951 nm. The characteristic temperature T0 was measured to be 333 K and 157 K for the temperature ranges of 40-180 K and 180-300 K, respectively
  • Keywords
    III-V semiconductors; current density; gallium arsenide; indium compounds; molecular beam epitaxial growth; quantum well lasers; semiconductor epitaxial layers; semiconductor growth; semiconductor quantum dots; 293 K; 40 to 300 K; 951 nm; InAs-GaAs; characteristic temperature; continuous-wave lasing; lasing wavelength; molecular beam epitaxy; quantum dot laser; threshold current density; Diode lasers; Gallium arsenide; Molecular beam epitaxial growth; Quantum dot lasers; Quantum dots; Quantum well lasers; Temperature distribution; Threshold current; Wavelength measurement; Wire;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuit Technology, 1998. Proceedings. 1998 5th International Conference on
  • Conference_Location
    Beijing
  • Print_ISBN
    0-7803-4306-9
  • Type

    conf

  • DOI
    10.1109/ICSICT.1998.786066
  • Filename
    786066