DocumentCode :
3068014
Title :
Design consideration for SOI gate controlled hybrid transistor operating at low voltage
Author :
Huang, Ru ; Yang, Bing ; Zhang, Xing ; Wang, Yangyuan
Author_Institution :
Inst. of Microelectron., Beijing Univ., China
fYear :
1998
fDate :
1998
Firstpage :
728
Lastpage :
731
Abstract :
The comprehensive design guidelines for SOI gate controlled hybrid transistor (GCHT) are provided in this paper for the first time, especially for GCHT operating at low voltage, which is an advantageous operating region of GCHT. The investigated mechanisms in this study involve short channel effects, current driving capability, device off-characteristics and open-circuit voltage gain. The design curves for low operating voltage are presented by synthesizing the results, with tradeoffs between different parameter requirements for different effects illustrated explicitly. The allowable design region is greatly-broadened, pointing out the direction for deep submicron device development
Keywords :
MOSFET; semiconductor device models; silicon-on-insulator; GCHT; SOI gate controlled hybrid transistor; Si-SiO2; current driving capability; deep submicron device development; design consideration; design curves; device off-characteristics; low voltage; open-circuit voltage gain; short channel effect; Energy consumption; Guidelines; Leakage current; Low voltage; MOSFET circuits; Microelectronics; Power supplies; Silicon; Threshold voltage; Voltage control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuit Technology, 1998. Proceedings. 1998 5th International Conference on
Conference_Location :
Beijing
Print_ISBN :
0-7803-4306-9
Type :
conf
DOI :
10.1109/ICSICT.1998.786088
Filename :
786088
Link To Document :
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