DocumentCode

3068183

Title

Reduction of the charging damage from electron shading

Author

Hashimoto, Koichi ; Hikosaka, Yukinobu ; Hasegawa, Akihiro ; Nakamura, Moritaka

Author_Institution

Fujitsu Limited

fYear

1996

fDate

14-14 May 1996

Firstpage

43

Lastpage

46

Keywords

Conducting materials; Conductors; Electrons; Etching; Plasma applications; Plasma density; Plasma devices; Plasma temperature; Pulse modulation; Robustness;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Process-Induced Damage, 1996 1st International Symposium on

Conference_Location

Santa Clara, CA, USA

Print_ISBN

0-9651577-0-9

Type

conf

DOI

10.1109/PPID.1996.715199

Filename

715199