Title :
Reduction of the charging damage from electron shading
Author :
Hashimoto, Koichi ; Hikosaka, Yukinobu ; Hasegawa, Akihiro ; Nakamura, Moritaka
Author_Institution :
Fujitsu Limited
Keywords :
Conducting materials; Conductors; Electrons; Etching; Plasma applications; Plasma density; Plasma devices; Plasma temperature; Pulse modulation; Robustness;
Conference_Titel :
Plasma Process-Induced Damage, 1996 1st International Symposium on
Conference_Location :
Santa Clara, CA, USA
Print_ISBN :
0-9651577-0-9
DOI :
10.1109/PPID.1996.715199
