• DocumentCode
    3069044
  • Title

    Process-Induced Gate Oxide Damage Issues in Advanced Plasma Chemical Vapor Deposition Processes

  • Author

    Cote, D. ; Nguyen, S. ; McGahay, V. ; Waskiewicz, C. ; Chang, S. ; Stamper, A. ; Weigand, P. ; Shoda, N. ; Matsuda, T.

  • Author_Institution
    IBM Microelectronics
  • fYear
    1996
  • fDate
    14-14 May 1996
  • Firstpage
    61
  • Lastpage
    66
  • Keywords
    Chemical vapor deposition; Etching; Fabrication; Microelectronics; Plasma applications; Plasma chemistry; Plasma density; Plasma devices; Plasma sources; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Process-Induced Damage, 1996 1st International Symposium on
  • Conference_Location
    Santa Clara, CA, USA
  • Print_ISBN
    0-9651577-0-9
  • Type

    conf

  • DOI
    10.1109/PPID.1996.715203
  • Filename
    715203
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3069044