Title :
Assessment of charge-induced damage from High Density Plasma (HDP) Oxide Deposition
Author :
Krishnan, Srikanth ; Nag, Somnath
Author_Institution :
Texas Instruments
Keywords :
Leakage current; MOS devices; Plasma applications; Plasma chemistry; Plasma density; Plasma devices; Plasma sources; Radio frequency; Sputter etching; Sputtering;
Conference_Titel :
Plasma Process-Induced Damage, 1996 1st International Symposium on
Conference_Location :
Santa Clara, CA, USA
Print_ISBN :
0-9651577-0-9
DOI :
10.1109/PPID.1996.715204
