DocumentCode
3070260
Title
Plasma Charging and Damage Evaluation of Reactive Ion Etching using Surface Photovoltage Technique and Corona Pulsed Deep Depletion Technique
Author
Nagalingam, Samuel ; Fung, Min-Su ; Thind, Satch
Author_Institution
Silicon Systems. Inc.
fYear
1996
fDate
13-14 May 1996
Firstpage
87
Lastpage
90
Keywords
Annealing; Corona; Etching; Plasma applications; Plasma measurements; Plasma temperature; Pollution measurement; Pulse measurements; Silicon; Surface charging;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Process-Induced Damage, 1996 1st International Symposium on
Print_ISBN
0-9651577-0-9
Type
conf
DOI
10.1109/PPID.1996.715209
Filename
715209
Link To Document