Phase transitions, curve evolution, and the control of semiconductor manufacturing processes

Author

Berg, Jordan ; Yezzi, Anthony ; Tannenbaum, Allen

Author_Institution

Inst. for Math. & Applications, Minnesota Univ., Minneapolis, MN, USA

Volume

3

fYear

1996

fDate

11-13 Dec 1996

Firstpage

3376

Abstract

This paper presents a strategy for the estimation and control of certain semiconductor manufacturing processes, employing models developed to describe the dynamics of material interfaces in phase transition problems. Previous work has successfully applied similar models to predict surface evolution in etching and deposition. Here, we propose to adapt these techniques to real-time process monitoring and control. The testbed for algorithm development is a highly simplified model of a plasma etch. Key elements of the scheme are investigated, and found to be feasible

Keywords

phase transformations; process control; real-time systems; semiconductor device manufacture; curve evolution; deposition; etching; phase transitions; real-time process control; real-time process monitoring; semiconductor manufacturing process control; surface evolution; Etching; Manufacturing processes; Monitoring; Phase estimation; Plasma applications; Plasma materials processing; Predictive models; Process control; Semiconductor materials; Testing;

fLanguage

English

Publisher

ieee

Conference_Titel

Decision and Control, 1996., Proceedings of the 35th IEEE Conference on

Conference_Location

Kobe

ISSN

0191-2216

Print_ISBN

0-7803-3590-2

Type

conf

DOI

10.1109/CDC.1996.573677

Filename

573677