Title :
Characterisation of a Gasonics A1000 Microwave Photoresist Ashing System using the CHARM-2 Plasma Charging Monitor
Author_Institution :
National Semiconductor (UK) Ltd.
Keywords :
CMOS process; Monitoring; Plasma density; Plasma devices; Plasma materials processing; Plasma measurements; Production systems; Qualifications; Resists; System testing;
Conference_Titel :
Plasma Process-Induced Damage, 1996 1st International Symposium on
Print_ISBN :
0-9651577-0-9
DOI :
10.1109/PPID.1996.715212
