DocumentCode
3071034
Title
The Effect of the Effective Channel Length Induced by Plasma Etching
Author
Yang, S.H. ; Lan, C.Y. ; Pang, S.L. ; Chang, B.J. ; Lu, K.L. ; Liu, J.S. ; Yang, J.J.
Author_Institution
Taiwan Semiconductor Manufacturing Company Ltd.
fYear
1996
fDate
14-14 May 1996
Firstpage
105
Lastpage
108
Keywords
Boron; Dry etching; Plasma applications; Plasma materials processing; Plasma measurements; Plasma simulation; Rough surfaces; Semiconductor films; Silicon; Surface roughness;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Process-Induced Damage, 1996 1st International Symposium on
Conference_Location
Santa Clara, CA, USA
Print_ISBN
0-9651577-0-9
Type
conf
DOI
10.1109/PPID.1996.715213
Filename
715213
Link To Document