Title :
The Effect of the Effective Channel Length Induced by Plasma Etching
Author :
Yang, S.H. ; Lan, C.Y. ; Pang, S.L. ; Chang, B.J. ; Lu, K.L. ; Liu, J.S. ; Yang, J.J.
Author_Institution :
Taiwan Semiconductor Manufacturing Company Ltd.
Keywords :
Boron; Dry etching; Plasma applications; Plasma materials processing; Plasma measurements; Plasma simulation; Rough surfaces; Semiconductor films; Silicon; Surface roughness;
Conference_Titel :
Plasma Process-Induced Damage, 1996 1st International Symposium on
Conference_Location :
Santa Clara, CA, USA
Print_ISBN :
0-9651577-0-9
DOI :
10.1109/PPID.1996.715213
