• DocumentCode
    3071122
  • Title

    Process-Induced Charge Damage in PETEOS for Interlevel Dielectric Applications

  • Author

    Denton, H. ; Grynkewich, G. ; Ilderem, V. ; Lin, F. ; Parris, P. ; Shin, H.C.

  • Author_Institution
    Advanced Custom Technologies, Motorola Inc.
  • fYear
    1996
  • fDate
    13-14 May 1996
  • Firstpage
    109
  • Lastpage
    112
  • Keywords
    Breakdown voltage; Degradation; Dielectrics; Plasma accelerators; Plasma applications; Plasma chemistry; Plasma devices; Plasma immersion ion implantation; Plasma materials processing; Sputter etching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Process-Induced Damage, 1996 1st International Symposium on
  • Print_ISBN
    0-9651577-0-9
  • Type

    conf

  • DOI
    10.1109/PPID.1996.715214
  • Filename
    715214
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3071122