DocumentCode
3071520
Title
Localized Pattern-Dependent Damage to Metal During Etch
Author
Gabriel, Calvin T.
Author_Institution
VLSI Technology, Inc.
fYear
1996
fDate
13-14 May 1996
Firstpage
117
Lastpage
119
Keywords
Aluminum alloys; Copper; Ocean temperature; Plasma applications; Plasma temperature; Resists; Scanning electron microscopy; Sputter etching; Sputtering; Tin;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Process-Induced Damage, 1996 1st International Symposium on
Print_ISBN
0-9651577-0-9
Type
conf
DOI
10.1109/PPID.1996.715216
Filename
715216
Link To Document