Title :
Localized Pattern-Dependent Damage to Metal During Etch
Author :
Gabriel, Calvin T.
Author_Institution :
VLSI Technology, Inc.
Keywords :
Aluminum alloys; Copper; Ocean temperature; Plasma applications; Plasma temperature; Resists; Scanning electron microscopy; Sputter etching; Sputtering; Tin;
Conference_Titel :
Plasma Process-Induced Damage, 1996 1st International Symposium on
Print_ISBN :
0-9651577-0-9
DOI :
10.1109/PPID.1996.715216
