DocumentCode :
3072092
Title :
Inductively Coupled Plasmas For Highly Efficient and Low Damage Resist Stripping
Author :
Savas, Stephen
Author_Institution :
Mattson Technology
fYear :
1996
fDate :
14-14 May 1996
Firstpage :
127
Lastpage :
130
Keywords :
Atomic measurements; Contamination; Electromagnetic heating; Electrons; Plasma materials processing; Plasma measurements; Plasma properties; Plasma sources; Pollution measurement; Resists;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Process-Induced Damage, 1996 1st International Symposium on
Conference_Location :
Santa Clara, CA, USA
Print_ISBN :
0-9651577-0-9
Type :
conf
DOI :
10.1109/PPID.1996.715219
Filename :
715219
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3072092
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