DocumentCode :
3072129
Title :
Horizontal gradient-freeze growth of InP crystals under controlled pressure
Author :
Iseler, G. ; Clark, H., Jr.
Author_Institution :
MIT Lincoln Lab., Lexington, MA, USA
fYear :
1990
fDate :
23-25 April 1990
Firstpage :
25
Lastpage :
29
Abstract :
The use of a horizontal gradient-freeze (HGF) method employing a sealed pressure-balanced system for synthesis and in situ crystal growth without encapsulation is described. The thermal stability of semi-insulating InP:Ti,Hg is discussed, and synthesis by conventional methods and by liquid-encapsulated Czochralski (LEC) growth is considered. Synthesis and HGF growth under controlled P pressure are then examined. Since the melt is not encapsulated, the P pressure can be adjusted to obtain the optimum melt composition for minimizing defect density, impurity contamination, and twinning. In addition, in situ growth prevents impurity contamination that can results when a growth charge synthesized in one system is transferred to a second system for crystal growth.<>
Keywords :
III-V semiconductors; crystal growth from melt; indium compounds; semiconductor growth; InP crystals; InP:Ti,Hg; LEC growth; controlled pressure; defect density; horizontal gradient freeze growth; impurity contamination; in situ crystal growth; liquid-encapsulated Czochralski; optimum melt composition; sealed pressure-balanced system; thermal stability; twinning; Annealing; Contamination; Crystals; Doping; Encapsulation; Impurities; Indium phosphide; Iron; Laboratories; Pressure control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 1990. Second International Conference.
Conference_Location :
Denver, CO, USA
Type :
conf
DOI :
10.1109/ICIPRM.1990.202981
Filename :
202981
Link To Document :
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