• DocumentCode
    3072129
  • Title

    Horizontal gradient-freeze growth of InP crystals under controlled pressure

  • Author

    Iseler, G. ; Clark, H., Jr.

  • Author_Institution
    MIT Lincoln Lab., Lexington, MA, USA
  • fYear
    1990
  • fDate
    23-25 April 1990
  • Firstpage
    25
  • Lastpage
    29
  • Abstract
    The use of a horizontal gradient-freeze (HGF) method employing a sealed pressure-balanced system for synthesis and in situ crystal growth without encapsulation is described. The thermal stability of semi-insulating InP:Ti,Hg is discussed, and synthesis by conventional methods and by liquid-encapsulated Czochralski (LEC) growth is considered. Synthesis and HGF growth under controlled P pressure are then examined. Since the melt is not encapsulated, the P pressure can be adjusted to obtain the optimum melt composition for minimizing defect density, impurity contamination, and twinning. In addition, in situ growth prevents impurity contamination that can results when a growth charge synthesized in one system is transferred to a second system for crystal growth.<>
  • Keywords
    III-V semiconductors; crystal growth from melt; indium compounds; semiconductor growth; InP crystals; InP:Ti,Hg; LEC growth; controlled pressure; defect density; horizontal gradient freeze growth; impurity contamination; in situ crystal growth; liquid-encapsulated Czochralski; optimum melt composition; sealed pressure-balanced system; thermal stability; twinning; Annealing; Contamination; Crystals; Doping; Encapsulation; Impurities; Indium phosphide; Iron; Laboratories; Pressure control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 1990. Second International Conference.
  • Conference_Location
    Denver, CO, USA
  • Type

    conf

  • DOI
    10.1109/ICIPRM.1990.202981
  • Filename
    202981