DocumentCode
3072778
Title
Development of novel electroless nickel for Selective electroless nickel immersion gold applications
Author
Lai, W. ; Wong, P.S. ; Hsu, K.L. ; Chan, C.M. ; Chan, C.Y. ; Bayes, M.W. ; Yee, K.W.
Author_Institution
Dow Electron. Mater., Hong Kong, China
fYear
2012
fDate
24-26 Oct. 2012
Firstpage
80
Lastpage
85
Abstract
There are a number of final finishing technologies available in the market, each with different cost and performance attributes. The unique attributes of the Selective ENIG process have made it a popular choice for mobile device and high density interconnect (HDI) applications. This hybrid final finishing process combines the benefits of both ENIG and organic solderability preservative (OSP) processes. ENIG surfaces typically exhibit excellent planarity, electrical contact performance, solderability, wire bondability and wear/abrasion resistance, while OSP shows excellent solder joint reliability. However, the OSP process, applied after the ENIG step, induces a great stress on the corrosion resistance of the ENIG deposit. Attack of the aggressive process chemistries used in the OSP process on an ENIG deposit with insufficient corrosion resistance might cause nickel corrosion, gold peel-off or solder joint failure, which could affect the reliability of final product. Appropriate corrosion protection against multiple passes through an OSP process is therefore required. A new electroless nickel, which is compatible with a low gold immersion gold process, has been developed to protect ENIG deposits from corrosion after multiple OSP exposures, and to minimize the potential for galvanic corrosion during immersion gold plating. In this article, the characteristics of this newly developed electroless nickel process are described. Corrosion resistance capability to OSP is compared with currently available ENIG processes. The solder joint intermetallic compound structure and reliability performance are also discussed.
Keywords
corrosion protection; corrosion resistance; electroless deposition; finishing; gold; nickel; printed circuit design; soldering; wear resistance; HDI application; OSP process; abrasion resistance; aggressive process chemistries; corrosion protection; corrosion resistance; electrical contact; electroless nickel immersion gold application; finishing process; galvanic corrosion; gold peel-off; high density interconnect; immersion gold plating; mobile device; nickel corrosion; organic solderability preservative process; selective ENIG process; solder joint failure; solder joint intermetallic compound structure; solder joint reliability; wear resistance; wire bondability; Copper; Corrosion; Gold; Nickel; Scanning electron microscopy; Soldering; Surface treatment;
fLanguage
English
Publisher
ieee
Conference_Titel
Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT), 2012 7th International
Conference_Location
Taipei
ISSN
2150-5934
Print_ISBN
978-1-4673-1635-4
Electronic_ISBN
2150-5934
Type
conf
DOI
10.1109/IMPACT.2012.6420219
Filename
6420219
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