DocumentCode :
3073109
Title :
A Comprehensive Study on Radiation Damage in Plasma System
Author :
Tsui, Bing-Yue ; Liu, Shunn-Her ; Ho, Jau-Hwang ; Chang, Chia-Haur
Author_Institution :
Industrial Technology Research Institute
fYear :
1996
fDate :
14-14 May 1996
Firstpage :
148
Lastpage :
150
Keywords :
Annealing; Dielectrics; Electric breakdown; Etching; MOS capacitors; Plasma applications; Plasma confinement; Plasma materials processing; Plasma measurements; Radio frequency;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Process-Induced Damage, 1996 1st International Symposium on
Conference_Location :
Santa Clara, CA, USA
Print_ISBN :
0-9651577-0-9
Type :
conf
DOI :
10.1109/PPID.1996.715225
Filename :
715225
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3073109
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