• DocumentCode
    3073272
  • Title

    Submicron double heterojunction strained InAlAs/InGaAs HEMTs: an experimental study of DC and microwave properties

  • Author

    Ng, G. ; Lai, R. ; Pavlidis, D. ; Pamulapati, J. ; Bhattacharya, P. ; Studer-Rabeler, K.

  • Author_Institution
    Michigan Univ., Ann Arbor, MI, USA
  • fYear
    1990
  • fDate
    23-25 April 1990
  • Firstpage
    424
  • Lastpage
    427
  • Abstract
    The DC and microwave characteristics of strained double-heterojunction InAlAs/InGaAs HEMTs with submicron gate lengths are presented. Low output conductance, (16-18 mS/mm) is retained even at short (0.25- mu m) gate length. Extrinsic f/sub T/ and f/sub max/ for these devices are as high as 82 GHz and 148 GHz, respectively. These results show the possibility of using the double-heterojunction approach and the associated improved carrier confinement in order to enhance the power gain performance. Microwave characterization of devices with different gate lengths revealed an effective carrier velocity of approximately 1.2*10/sup 7/ cm/s, indicating that carrier transport may be limited by the quality of the inverted heterointerface. Growth interruption optimization may further improve the performance of these devices.<>
  • Keywords
    III-V semiconductors; aluminium compounds; gallium arsenide; high electron mobility transistors; indium compounds; solid-state microwave devices; 0.25 micron; 0.5 to 26.5 GHz; 148 GHz; 16 to 18 mS; 82 GHz; DC properties; InAlAs-InGaAs; carrier confinement; cutoff frequency; effective carrier velocity; maximum frequency of oscillation; microwave properties; output conductance; power gain performance; strained double heterojunction HEMT; submicron gate lengths; Carrier confinement; HEMTs; Heterojunctions; Indium compounds; Indium gallium arsenide; Indium phosphide; MODFETs; Superlattices; Tellurium; Temperature measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 1990. Second International Conference.
  • Conference_Location
    Denver, CO, USA
  • Type

    conf

  • DOI
    10.1109/ICIPRM.1990.203059
  • Filename
    203059