Photons, Charging Currents, Hydrogen, and Particle Bombardment - The Four Horsemen of Plasma Etching

Author

Fonash, Stephen J.

Author_Institution

Pennsylvania State University

fYear

1996

fDate

14-14 May 1996

Firstpage

195

Lastpage

197

Keywords

Annealing; Deuterium; Etching; Hydrogen; Plasma applications; Plasma devices; Plasma measurements; Plasma simulation; Plasma sources; Stress;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Process-Induced Damage, 1996 1st International Symposium on

Conference_Location

Santa Clara, CA, USA

Print_ISBN

0-9651577-0-9

Type

DOI

10.1109/PPID.1996.715236

Filename

715236

Link To Document