Title :
Photons, Charging Currents, Hydrogen, and Particle Bombardment - The Four Horsemen of Plasma Etching
Author :
Fonash, Stephen J.
Author_Institution :
Pennsylvania State University
Keywords :
Annealing; Deuterium; Etching; Hydrogen; Plasma applications; Plasma devices; Plasma measurements; Plasma simulation; Plasma sources; Stress;
Conference_Titel :
Plasma Process-Induced Damage, 1996 1st International Symposium on
Conference_Location :
Santa Clara, CA, USA
Print_ISBN :
0-9651577-0-9
DOI :
10.1109/PPID.1996.715236
