Title :
Control of RIE-induced Surface Damage and Junction Leakage Current in Field Isolation Process
Author :
Yamaguchi, T. ; Sasaki, T. ; Nikoh, H.
Author_Institution :
Kyoto Research Laboratory
Keywords :
Beak; Chemicals; Electrons; Etching; Helium; Leakage current; Oxidation; Plasma applications; Silicon compounds; Surface treatment;
Conference_Titel :
Plasma Process-Induced Damage, 1996 1st International Symposium on
Print_ISBN :
0-9651577-0-9
DOI :
10.1109/PPID.1996.715237
