DocumentCode

3075327

Title

Control of RIE-induced Surface Damage and Junction Leakage Current in Field Isolation Process

Author

Yamaguchi, T. ; Sasaki, T. ; Nikoh, H.

Author_Institution

Kyoto Research Laboratory

fYear

1996

fDate

13-14 May 1996

Firstpage

198

Lastpage

201

Keywords

Beak; Chemicals; Electrons; Etching; Helium; Leakage current; Oxidation; Plasma applications; Silicon compounds; Surface treatment;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Process-Induced Damage, 1996 1st International Symposium on

Print_ISBN

0-9651577-0-9

Type

conf

DOI

10.1109/PPID.1996.715237

Filename

715237