DocumentCode :
3075417
Title :
Technology of double side exposure and bonding for fabrication of accelerometer
Author :
Zhang, Taiping ; Li, Ting ; Deng, Ke
Author_Institution :
Peking Univ., Beijing, China
fYear :
1998
fDate :
1998
Firstpage :
925
Lastpage :
927
Abstract :
The authors use double sided exposure and bonding and deep etching to fabricate accelerometers and gyroscopes. The technology is based on MEMS processing. The sensor testing is presented
Keywords :
accelerometers; etching; gyroscopes; microsensors; semiconductor device testing; wafer bonding; MEMS processing; accelerometer; bonding; deep etching; double side exposure; fabrication; gyroscopes; sensor testing; Accelerometers; Electrodes; Etching; Fabrication; Fixtures; Glass; Micromechanical devices; Shape; Silicon; Wafer bonding;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuit Technology, 1998. Proceedings. 1998 5th International Conference on
Conference_Location :
Beijing
Print_ISBN :
0-7803-4306-9
Type :
conf
DOI :
10.1109/ICSICT.1998.786524
Filename :
786524
Link To Document :
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