DocumentCode
3075664
Title
Thermally excited micromechanical vacuum resonator
Author
Yaqiang, Wang ; Zhonghe, Jin ; Yuelin, Wang ; Chun, Ding
Author_Institution
Dept. of Inf. & Electron. Eng., Zhejiang Univ., Hangzhou, China
fYear
1998
fDate
1998
Firstpage
950
Lastpage
952
Abstract
A micromechanical resonator is proposed and realized. It consists of a single-crystal silicon beam and two P-type silicon resistors. One resistor is used to excite the vibrating beam and the other to sense vibration of the beam. The dimensions of the resonator are about 4×2.5 mm2, the resonant frequency is about 7.8 KHz, Q factor about 190 in air and above 2500 in vacuum degree of 7.5×10 -4 Pa. The theory of thermal excitation is analyzed and the characteristics of the resonator are tested. We conclude that the resonator can be applied to vacuum measurement by the means of closed-loop resonating circuit. The design and realization of the circuit are described
Keywords
etching; frequency response; micromachining; micromechanical resonators; microsensors; vacuum measurement; vibrations; 2.5 mm; 4 mm; 7.5E-4 Pa; 7.8 kHz; P-type silicon resistors; Q factor; Si; anisotropic etching; cantilever beam; closed-loop resonating circuit; frequency response; micromechanical vacuum resonator; process flow; single-crystal silicon beam; thermally excited; vacuum measurement; Circuits; Etching; Fluid flow measurement; Frequency measurement; Heating; Lithography; Micromechanical devices; Q factor; Resistors; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuit Technology, 1998. Proceedings. 1998 5th International Conference on
Conference_Location
Beijing
Print_ISBN
0-7803-4306-9
Type
conf
DOI
10.1109/ICSICT.1998.786540
Filename
786540
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