DocumentCode :
3076212
Title :
Plasma Etching Process Induced Closed-loop Metal Pattern Damage
Author :
Chu, Po-Tao ; Yeh, Ming-Chieh ; Hung, Chih-Chien ; Lin, Ting-Huang ; Chao, Ying-Chen
Author_Institution :
Taiwan Scmiconductor manufacturing Company
fYear :
1996
fDate :
13-14 May 1996
Firstpage :
219
Lastpage :
222
Keywords :
Etching; Fuses; Integrated circuit interconnections; Plasma applications; Plasma density; Plasma materials processing; Plasma temperature; Random access memory; Resists; Scanning electron microscopy;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Process-Induced Damage, 1996 1st International Symposium on
Print_ISBN :
0-9651577-0-9
Type :
conf
DOI :
10.1109/PPID.1996.715242
Filename :
715242
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3076212
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