DocumentCode :
3078426
Title :
An endurance-enhanced Flash Translation Layer via reuse for NAND flash memory storage systems
Author :
Wang, Yi ; Liu, Duo ; Qin, Zhiwei ; Shao, Zili
Author_Institution :
Dept. of Comput., Hong Kong Polytech. Univ., Kowloon, China
fYear :
2011
fDate :
14-18 March 2011
Firstpage :
1
Lastpage :
6
Abstract :
NAND flash memory is widely used in embedded systems due to its non-volatility, shock resistance and high cell density. In recent years, various Flash Translation Layer (FTL) schemes (especially hybrid-level FTL schemes) have been proposed. Although these FTL schemes provide good solutions in terms of endurance and wear-leveling, none of them have considered to reuse free pages in both data blocks and log blocks during a merge operation. By reusing these free pages, less free blocks are needed and the endurance of NAND flash memory is enhanced. We evaluate our reuse strategy using a variety of application specific I/O traces from Windows systems. Experimental results show that the proposed scheme can effectively reduce the erase counts and enhance the endurance of flash memory.
Keywords :
embedded systems; flash memories; NAND flash memory storage systems; Windows systems; application specific I/O traces; data blocks; embedded systems; endurance-enhanced flash translation layer; high cell density; hybrid-level FTL schemes; log blocks; nonvolatility; shock resistance; Ash; Embedded systems; Flash memory; Memory management; Nonvolatile memory; Time factors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design, Automation & Test in Europe Conference & Exhibition (DATE), 2011
Conference_Location :
Grenoble
ISSN :
1530-1591
Print_ISBN :
978-1-61284-208-0
Type :
conf
DOI :
10.1109/DATE.2011.5763009
Filename :
5763009
Link To Document :
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